Stacked Insulator Induction Accelerator Gaps

Stacked insulators, with alternating layers of insulating material and conducting film, have been shown to support high surface electrical field stresses. We have investigated the application of the stacked insulator technology to the design of induction accelerator modules for the Relativistic-Klystron Two-Beam Accelerator program. The rf properties of the accelerating gaps using stacked insulators, particularly the impedance at frequencies above the beam pipe cutoff frequency, are investigated. Low impedance is critical for RelativisticKlystron Two-Beam Accelerator applications where a high current, bunched beam is transported through many accelerating gaps. An induction accelerator module designs using a stacked insulator is presented.